EUV Lithography Pathfinding Engineer (High NA)

Micron; Boise (ID); Vor Ort; USD 120.000 - 180.000; Vollzeit

Benefits dieser Stelle

Medical benefits

Paid time off

Retirement options

Zusammenfassung

Micron Technology in Boise, Idaho is seeking a Lithography Pathfinding Process Development Engineer to drive next‑generation lithography capabilities from concept to production. This role focuses on EUV and High NA EUV, partnering across technology development and manufacturing to ensure readiness for high‑volume production.

You'll lead pathfinding efforts across 193nm immersion, EUV, and High NA EUV, develop EUV modules, and collaborate with defect inspection and mask teams.

Qualifikationen

• MS or PhD in Engineering, Chemistry, Physics, or related field with 3+ years semiconductor experience or BS with 10+ years relevant experience.
• Strong understanding of EUV lithography and distinctions from DUV lithography.
• Experience with 193nm immersion multiple patterning (LELE, SAQP).
• Knowledge of photolithography optics or simulation tools such as Prolith or S-Litho.

Aufgaben

• Lead pathfinding efforts for advanced patterning technologies across 193nm immersion, EUV, and High NA EUV.
• Develop and optimize EUV lithography modules in the technology development environment.
• Partner with defect inspection and mask teams to define EUV mask inspection strategies.
• Collaborate with manufacturing sites to align process transfer, equipment, and materials readiness.
• Travel as needed (up to once per month) to support High NA EUV development and early learning activities.

Kenntnisse

EUV Lithography

High NA EUV

Patterning

Statistical Analysis

Ausbildung

MS/PhD in Engineering

BS + 10+ years experience

Tools

Prolith

S-Litho

Python

Jobbeschreibung

Micron Technology in Boise, Idaho is seeking a Lithography Pathfinding Process Development Engineer to drive next‑generation lithography capabilities from concept to production. This role focuses on EUV and High NA EUV, partnering across technology development and manufacturing to ensure readiness for high‑volume production.

You'll lead pathfinding efforts across 193nm immersion, EUV, and High NA EUV, develop EUV modules, and collaborate with defect inspection and mask teams.