EHS Program Manager: Safety, Compliance & Sustainability
Sun-Chemical
Don’t send a generic resume — generate a resume and cover letter tailored to this exact role.
Benefits offered by this job
Job summary
Sun Chemical’s Valparaiso site seeks an experienced EHS professional to drive site safety, environmental compliance, and sustainability initiatives within a highly regulated manufacturing setting. You will collaborate with the Plant Leadership Team to advance PSM/RMP programs and regulatory reporting, and lead training and investigations.
Ideal candidates hold a Bachelor’s degree in a related field, 5+ years in EHS, and 3+ years in PSM/RMP environments.
Qualifications
- Bachelor's degree in a related field (Environmental Science, Chemistry, Engineering, etc)
- 5+ years’ EHS experience in a manufacturing environment
- 3+ years’ experience in a PSM and/or RMP facility
- Strong expertise in regulatory compliance systems and safety programs
- Proficient user of MS Office products
Responsibilities
- Ensure activities comply with local, state, and federal EHS regulations
- Serve as EHS representative on plant leadership team and during external visits/audits
- Upgrade and maintain PSM & RMP programs and related compliance
- Prepare routine regulatory reports and filings (UIC, Tier II, TRI, RMP) and maintain permits
- Lead EHS training, record-keeping, and incident investigations
- Develop strategic improvement plans with PLT and corporate EHS
- Support wastewater management and RCRA compliance
- Coordinate sustainability initiatives and other duties as assigned
Skills
Education
Job description
Sun Chemical’s Valparaiso site seeks an experienced EHS professional to drive site safety, environmental compliance, and sustainability initiatives within a highly regulated manufacturing setting. You will collaborate with the Plant Leadership Team to advance PSM/RMP programs and regulatory reporting, and lead training and investigations.
Ideal candidates hold a Bachelor’s degree in a related field, 5+ years in EHS, and 3+ years in PSM/RMP environments.
'/%3e%3cpath%20d='M101.744%2012.4726L102.894%2016.1947L99.0021%2013.2201L101.744%2012.4726ZM105.3%208.40937H100.488L99.0026%203.59473L97.5116%208.41047L92.7%208.40385L96.5965%2011.3834L95.1055%2016.1942L99.0021%2013.2196L101.408%2011.3834L105.3%208.40992V8.40937Z'%20fill='white'/%3e%3cdefs%3e%3clinearGradient%20id='paint0_linear_5593_1381'%20x1='90'%20y1='9.44471'%20x2='99'%20y2='9.44471'%20gradientUnits='userSpaceOnUse'%3e%3cstop%20stop-color='%2300AD70'/%3e%3cstop%20offset='0.998594'%20stop-color='%2300B67A'/%3e%3cstop%20offset='1'%20stop-color='%23DCDCE6'/%3e%3c/linearGradient%3e%3c/defs%3e%3c/svg%3e){kind=small}
