Dry Etch Process Development Engineer for Next‑Gen HDD

Headway Technologies; Milpitas (CA); On-site; USD 97,000 - 142,000; Full time

Job summary

Headway Technologies seeks a Dry Etch Process Development Engineer (Reader) to develop and implement RIE, IBE, and Ashing for next generation magnetic recording heads. You’ll design experiments, analyze data, and present findings to improve yield and manufacturability, under the Director of Dry Etch Process Development in Milpitas, CA.

Applicants should have a BS in Materials Science, Physics, or Electrical Engineering, 3+ years in the HDD/semiconductor industry, and hands-on experience with

Qualifications

• Bachelor’s degree in Materials Science, Physics, or Electrical Engineering; Master’s degree preferred.

Responsibilities

• Develops and implements new dry etch processes (RIE, IBE, and Ashing) for next generation magnetic recording heads.
• Implements new process control schemes to ensure product manufacturability.
• Designs and conducts experiments, analyzes data, and develops recommendations for improving performance and yield.
• Reviews characterization data from FIB, SEM, and TEM to identify root causes and corrective actions.
• Collaborates with process, product engineering, and equipment teams to deliver programs and improve efficiency.
• Oversees technicians to ensure accurate process execution and wafer disposition.

Education

Materials ScienceBachelor’s degree

Physics Bachelor’s degree

Electrical Engineering Bachelor’s degree

Master’s degree (preferred)

Job description

Headway Technologies seeks a Dry Etch Process Development Engineer (Reader) to develop and implement RIE, IBE, and Ashing for next generation magnetic recording heads. You’ll design experiments, analyze data, and present findings to improve yield and manufacturability, under the Director of Dry Etch Process Development in Milpitas, CA.

Applicants should have a BS in Materials Science, Physics, or Electrical Engineering, 3+ years in the HDD/semiconductor industry, and hands-on experience with