AI-Assisted Metrology & Defect Analysis Specialist

Micron Technology, Inc

Singapore

On-site

SGD 42,000 - 66,000

Full time

14 days+
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Job summary

Micron Technology, Inc. is seeking a Metrology & Real-Time Defect Analysis Technician. You will support semiconductor process monitoring and defect detection using advanced inspection and measurement systems.

Responsibilities include operating metrology equipment, data collection, and assisting with defect investigations. 12-hour shifts and a technical diploma are required; AI-enabled data analysis experience is a plus.

Qualifications

  • Must have a technical qualification in engineering or related discipline.
  • Ability to read and interpret measurement data and procedures.
  • Familiarity with lab or semiconductor inspection environments is a plus.

Responsibilities

  • Operate metrology and inspection equipment according to procedures.
  • Perform measurements and ensure accuracy and repeatability.
  • Monitor tool health and performance of measurements.
  • Collect and organize inspection and defect data for engineering review.
  • Support defect investigations and root cause analysis activities.
  • Perform basic equipment troubleshooting and recovery.
  • Support preventive maintenance and tool monitoring programs.
  • Ensure compliance with operational and quality procedures.
  • Utilize AI-enabled data analysis tools to improve data processing.

Skills

Analytical skills
Data interpretation
Computer literacy
Technical equipment familiarity

Education

Nitec / Higher Nitec / Diploma in Engineering or related disciplines

Job description

Micron Technology, Inc. is seeking a Metrology & Real-Time Defect Analysis Technician. You will support semiconductor process monitoring and defect detection using advanced inspection and measurement systems.

Responsibilities include operating metrology equipment, data collection, and assisting with defect investigations. 12-hour shifts and a technical diploma are required; AI-enabled data analysis experience is a plus.

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