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Center for Nitride Semiconductor Physics and Technology “GaN-Unipress” poszukuje Junior Postdoctoral Researcher do badań teoretycznych, obliczeniowych i eksperymentalnych nad GaN i materiałami wide-bandgap. Kandydat wniesie doświadczenie w modelowaniu numerycznym, DFT/ab initio i współpracę ze specjalistami ds. eksperymentów.
Wymagane jest doktorat, publikacje i biegła znajomość angielskiego. Praca obejmuje opracowywanie cyfrowych twinów procesu, symulacje wzrostu i analizy danych, w zespole z
Nazwa oferty: Junior Postdoctoral Researcher (JPR) – Computational Materials Science
Nazwa stanowiska: Postdoc Position
Organizacja: Center for Nitride Semiconductor Physics and Technology “GaN-Unipress”, an independent research unit of the Institute of High Pressure Physics, Polish Academy of Sciences
Tytuł projektu: Center for Nitride Semiconductor Physics and Technology “GaN-Unipress”
Preferred Qualifications:
The Junior Postdoctoral Researcher will conduct theoretical, computational, and experimental research onGaN and related III-nitride semiconductor materials within WP4 (Materials Informatics). The work will focus onunderstanding their structural, electronic, optical, and thermodynamic properties, crystal defects, doping mechanisms, and growth processes using theoretical approaches, including atomistic simulations and first-principles methods such asdensity functional theory (DFT).
The candidate will contribute tomodeling and optimization of ammonothermal GaN crystal growth in collaboration with WP1. Research activities may include numerical simulations of crystal growth mechanisms, thermodynamics, heat and mass transport, fluid dynamics, and growth kinetics. The candidate will also participate in developing adigital twin of the ammonothermal growth process byintegrating physics-based models, experimental data, and predictive approaches. Using data science, machine learning (ML), and artificial intelligence (AI) methods, the team will investigate relationships between technological process parameters, material properties, defect formation, and crystal quality tosupport process optimization and predictive modeling.
In the area of epitaxial growth and doping technologies, the candidate will closely collaborate with experimental teams working onMOCVD, HVPE, ion implantation, and ultra-high-pressure annealing (UHPA). Asolid understanding of epitaxial processes and defect formation mechanisms will be important for developing reliable simulation strategies and supporting technology optimization. The ability tocombine theoretical modeling with hands-on experimental research will be particularly valued.
The candidate will collaborate with researchers across WP1–WP3, contribute tointerdisciplinary scientific publications, and present research results atinternational conferences.
Required documents:
Personal data protection clause (GDPR)
Due tothe entry into force of Regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016 (General Data Protection Regulation – GDPR), werequire that your application includes astatement of consent tothe processing of your personal data bythe institution conducting the recruitment process.
In accordance with Article 13 of Regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016 onthe protection of natural persons with regard tothe processing of personal data and onthe free movement of such data (Official Journal of the EU L119/1 of 4 May 2016), the Institute of High Pressure of the Polish Academy of Sciences informs that: