A complete application in a minute
Tailored resume and cover letter, ready to send.
Institute of High Pressure Physics, Polish Academy of Sciences in Poland seeks a Junior Postdoctoral Researcher for computational materials science focused on GaN and related III‑nitride systems. The role combines theory, simulations, and experimental collaboration to model growth, defects and properties.
The 40‑hour work week and a contract until end 2029 support advanced research in different WP areas, with ML‑driven process optimization and AI tools to link parameters with material quality.
Institute of High Pressure Physics, Polish Academy of Sciences
Organisation/Company Institute of High Pressure Physics, Polish Academy of Sciences Research Field Physics » Computational physics Engineering » Materials engineering Physics » Condensed matter properties Physics » Other Researcher Profile Recognised Researcher (R2) Positions Postdoc Positions Application Deadline 28 Oct 2026 - 23:59 (Europe/Warsaw) Country Poland Type of Contract Temporary Job Status Full-time Hours Per Week 40 Offer Starting Date 1 Nov 2026 Is the job funded through the EU Research Framework Programme? Not funded by a EU programme Is the Job related to staff position within a Research Infrastructure? No
Position in the project: Junior Postdoctoral Researcher (JPR) – Computational Materials Science
Research Field: Computational Materials Science / Condensed Matter Physics / Semiconductor Physics / Materials Science
Scientific discipline: Physics / Materials Engineering
Job type (employment contract/stipend): Employment contract
Working time (full-time / part-time, hours per week): Full-time position (40 hours per week)
Number of positions available: 1
Monthly remuneration (total employer’s cost): 15000 - 20000 PLN
Expected net salary (approximate): 8 800 - 11600 PLN
Position starts on: November/December 2026
Maximum period of contract/stipend agreement: Contract until 31 December 2029
Institution (full official name): Center for Nitride Semiconductor Physics and Technology “GaN-Unipress”, an independent research unit of the Institute of High Pressure Physics, Polish Academy of Sciences
Project title: Center for Nitride Semiconductor Physics and Technology “GaN-Unipress”
Funding programme: Project International Research Agendas (MAB), Grant No. FENG.02.01-IP.05-M042/25
Research Field Physics Education Level PhD or equivalent
Research Field Engineering » Materials engineering Education Level PhD or equivalent
Research Field Physics » Computational physics Education Level PhD or equivalent
Research Field Engineering » Electrical engineering Education Level PhD or equivalent
Skills/Qualifications
Scope of work:
The Junior Postdoctoral Researcher will conduct theoretical, computational, and experimental research on GaN and related III-nitride semiconductor materials within WP4 (Materials Informatics). The work will focus on understanding their structural, electronic, optical, and thermodynamic properties, crystal defects, doping mechanisms, and growth processes using theoretical approaches, including atomistic simulations and first-principles methods such as density functional theory (DFT).
The candidate will contribute to modeling and optimization of ammonothermal GaN crystal growth in collaboration with WP1. Research activities may include numerical simulations of crystal growth mechanisms, thermodynamics, heat and mass transport, fluid dynamics, and growth kinetics. The candidate will also participate in developing a digital twin of the ammonothermal growth process by integrating physics-based models, experimental data, and predictive approaches. Using data science, machine learning (ML), and artificial intelligence (AI) methods, the team will investigate relationships between technological process parameters, material properties, defect formation, and crystal quality to support process optimization and predictive modeling.
In the area of epitaxial growth and doping technologies, the candidate will closely collaborate with experimental teams working on MOCVD, HVPE, ion implantation, and ultra-high-pressure annealing (UHPA). A solid understanding of epitaxial processes and defect formation mechanisms will be important for developing reliable simulation strategies and supporting technology optimization. The ability to combine theoretical modeling with hands‑on experimental research will be particularly valued.
The candidate will collaborate with researchers across WP1–WP3, contribute to interdisciplinary scientific publications, and present research results at international conferences.
Specific Requirements
Profile of candidates/requirements:
Preferred Qualifications:
Languages POLISH Level Good
Research Field Physics Years of Research Experience 1 - 4
Research Field Engineering » Materials engineering Years of Research Experience 1 - 4
Selection process
Required documents:
All documents must be submitted in English in PDF format. Applications that do not comply with the formal requirements may be excluded from further consideration.
Personal data protection clause (GDPR)
Due to the entry into force of Regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016 (General Data Protection Regulation – GDPR), we require that your application includes a statement of consent to the processing of your personal data by the institution conducting the recruitment process.
To allow us to process your data, please include the following statement in your application:
“I hereby consent to the processing of my personal data by the Institute of High Pressure of the Polish Academy of Sciences, with its registered office at Sokolowska 29/37, 01-142 Warsaw, Poland, for the purpose of carrying out the recruitment process, selecting a candidate, and concluding an employment contract at the Institute of High Pressure of the Polish Academy of Sciences. I have been informed of my rights and obligations. I understand that the provision of my personal data is voluntary.”
In accordance with Article 13 of Regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016 on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (Official Journal of the EU L119/1 of 4 May 2016), the Institute of High Pressure of the Polish Academy of Sciences informs that:
The project “Center for Nitride Semiconductor Physics and Technology – GaN-Unipress” focuses on advanced research and technology development of gallium nitride (GaN) materials and devices for power electronics and quantum applications. The program integrates bulk GaN crystal growth using the ammonothermal method, advanced epitaxial techniques (MOVPE, HVPE, MBE), ion implantation with ultra‑high‑pressure annealing, and AI/ML-supported process optimization.
The research activities are organized into four interacting work packages: (WP1) growth and processing of high‑quality GaN substrates, (WP2) development of GaN‑based power diodes (p–n, p–i–n and Schottky structures), (WP3) rare‑earth‑doped GaN structures for single‑photon sources and quantum sensing, and (WP4) data‑driven optimization of materials growth and device fabrication processes.
The project aims not only to advance the scientific understanding of GaN materials, but also to develop mature technological processes and deliver validated device structures and demonstrators ready for further industrial implementation.