Senior Lithography & Photomask Process Engineer – EUV/DUV

Intel Corporation; Leixlip; Hybrid; EUR 103,000 - 161,000; Full time

Job summary

Intel Corporation in Leixlip, Ireland, is seeking a Senior Lithography and Photomask Process Engineer to lead photomask operations and EUV/DUV process development. You will partner with Scanner/Litho, Reticle Design, Thin Films, Etch, and Yield teams to diagnose patterning issues and speed technology transitions.

Responsibilities include yield ramp and excursion containment, RCFA, and mentorship of junior engineers while delivering SOPs and engineering documentation for process improvement.

Qualifications

• MS with 8+ years in semiconductor lithography or photomask technology.
• Experience in HVM or advanced technology development fabs.
• In-depth knowledge of mask fabrication, pellicle tech, and defect inspection.

Responsibilities

• Oversee photomask incoming QC, pellicle integrity, reticle qualification, and lifecycle management.
• Drive EUV pellicle development and material optimization for yield improvement.
• Lead RCFA for yield-limiting defects during node development and high-volume manufacturing.
• Provide technical leadership and SOPs; mentor junior engineers.

Skills

Leadership

Cross-functional collaboration

Statistical analysis

DOE / SPC

Python / MATLAB

Education

MS in Electrical/Materials/Physics

PhD in Foundry-related field

Tools

ASML Twinscan/NXE

Mask metrology

JMP

Job description

Intel Corporation in Leixlip, Ireland, is seeking a Senior Lithography and Photomask Process Engineer to lead photomask operations and EUV/DUV process development. You will partner with Scanner/Litho, Reticle Design, Thin Films, Etch, and Yield teams to diagnose patterning issues and speed technology transitions.

Responsibilities include yield ramp and excursion containment, RCFA, and mentorship of junior engineers while delivering SOPs and engineering documentation for process improvement.