Senior Lithography & Photomask Engineer - EUV/DUV Lead

Intel Corporation

Leixlip

On-site

EUR 103,000 - 161,000

Full time

5 days ago

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Job summary

Intel Corporation in Ireland, Leixlip, is seeking an experienced process engineer to lead photomask and reticle operations, including pellicle development and lifecycle management for EUV and DUV toolsets. You will partner with Scanner/Litho, Reticle Design, and Yield teams to diagnose excursions and accelerate technology transitions.

The role emphasizes yield ramp, root-cause analysis, SOPs, and direct collaboration with lithography suppliers.

Qualifications

MS with 8+ years in foundry or PhD in a related semiconductor field.
8+ years hands-on process engineering in lithography and photomask/reticle tech.
In-depth mask fabrication, metrology, pellicle tech, and defect inspection knowledge.
Proficiency with DUV and EUV exposure systems, track integration, and CD metrology.
Advanced use of SPC/DOE and yield analytics tools (JMP, Python, MATLAB).
Leadership, cross-functional collaboration, and executive communication.

Responsibilities

Oversee photomask inbound QC, pellicle integrity, reticle qualification and lifecycle.
Drive EUV pellicle development and optimize pellicle/reticle usage and yield.
Collaborate with Scanner/Litho, Reticle Design, Thin Films, and Yield teams to diagnose excursions.
Lead RCFA for yield-limiting defects during node development and high-volume manufacturing.
Mentor engineers, establish SOPs, and liaise with lithography equipment suppliers.