MoS2 Photoelectrochemistry Internship: Atomic-Scale Control

Imec

Vlaams-Brabant

On-site

EUR 12,000 - 19,000

Full time

2 days ago
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Benefits offered by this job

Allowance for non-Belgian university學生
Reference code 2026-INT-337

Job summary

Imec invites applications for a Master internship in photoelectrochemistry of single MoS₂ monolayers. You will study how light, band alignment and sulfur vacancies affect passivation and etching in atomic-scale control relevant to 2D transistor processing.

You will use controlled illumination electrochemistry, XPS, photoluminescence and ultra-trace ICP-MS, with AFM, TEM and ERDA available to support the work, in a multicultural Surface and Interface Processing group.

Qualifications

  • Master internship in chemistry/chemical engineering or physics.
  • Experience with electrochemistry and surface analysis techniques is advantageous.
  • Willingness to work in a multidisciplinary, multicultural environment.

Responsibilities

  • Study the photoelectrochemistry of MoS₂ monolayers and link interfacial charge transfer to optical and electronic properties.
  • Use electrochemistry under controlled illumination to map band energetics.
  • Apply XPS, photoluminescence and ICP-MS to analyze surface composition, doping and passivation.
  • Perform AFM, TEM, ERDA and electrical measurements to support results.

Skills

Photoelectrochemistry
Band energetics
Interdisciplinary teamwork

Education

Chemistry/Chemical Engineering, Physics

Tools

LSV
EIS
Mott–Schottky
XPS
Photoluminescence
ICP-MS
AFM
TEM
ERDA
Electrical measurements

Job description

Imec invites applications for a Master internship in photoelectrochemistry of single MoS₂ monolayers. You will study how light, band alignment and sulfur vacancies affect passivation and etching in atomic-scale control relevant to 2D transistor processing.

You will use controlled illumination electrochemistry, XPS, photoluminescence and ultra-trace ICP-MS, with AFM, TEM and ERDA available to support the work, in a multicultural Surface and Interface Processing group.

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