Lead Lithography Track Engineer for Advanced Patterning R&D

imec in Vlaanderen; Vlaams-Brabant; Sur place; EUR 90 000 - 130 000; Plein temps

Résumé du poste

IMEC in Leuven, Belgium, is seeking a lithography track expert to advise partners on tool usage and process improvements. The role focuses on maintaining process stability for advanced nodes and serving as the central contact for track-related topics, collaborating with tool suppliers and IMEC groups.

You will lead R&D for spin-on photoresists and underlayers, drive Joint Development Projects with suppliers, and develop solutions using advanced knowledge.

Qualifications

• PhD or equivalent experience in a relevant science/engineering field.
• Strong background in lithography and photoresist processes.
• Willingness to work in a cleanroom environment.

Responsabilités

• Advise internal and external partners on lithography tool usage and best-known methods.
• Monitor track performance and ensure process stability for advanced nodes.
• Act as central contact for track process and hardware topics, coordinating with suppliers and IMEC groups.
• Facilitate R&D activities for spin-on photoresists and underlayers with patterning material suppliers.
• Own and drive Joint Development Projects with suppliers to support the Advanced Patterning Process Program.
• Develop solutions using formal education, statistics, and in-house tools.
• Travel domestically and internationally as needed.
• Identify IP opportunities, file disclosures, present at conferences, and write journal articles.

Connaissances

Lithography knowledge

Photoresist knowledge

Hands-on cleanroom

Communication skills

Networking skills

Knowledge sharing

Entrepreneurial mindset

Multitasking

Technical problem-solving

Formation

PhD in Physics, Chemistry, Physical Chemistry or Materials Engineering

Description du poste

IMEC in Leuven, Belgium, is seeking a lithography track expert to advise partners on tool usage and process improvements. The role focuses on maintaining process stability for advanced nodes and serving as the central contact for track-related topics, collaborating with tool suppliers and IMEC groups.

You will lead R&D for spin-on photoresists and underlayers, drive Joint Development Projects with suppliers, and develop solutions using advanced knowledge.