Senior Photo Process Engineer - Scanner Metrology

Micron Technology, Inc; Boise (ID); On-site; USD 85,000 - 105,000; Full time

Job summary

Micron Technology, Inc in Boise, Idaho, is seeking a Senior Photo Process Engineer to develop and optimize advanced metrology solutions for world-class lithography performance. The role involves overlay measurement and alignment accuracy to ensure precise pattern placements critical to advanced DRAM manufacturing.

The successful candidate will have over 5 years in semiconductor industry experience, focusing on scanner metrology and overlay techniques, alongside a Bachelor's or Master's degree in Engineering or a related field. International travel for onboarding and training may be required.

Qualifications

• 5+ years of semiconductor industry experience focused on scanner metrology.
• Hands-on experience with KLA tools and diffraction-based overlay techniques.
• Bachelor’s degree or equivalent military experience in a relevant field.

Responsibilities

• Develop and sustain scanner metrology solutions for photolithography.
• Drive improvements in overlay performance and alignment accuracy.
• Perform root cause analysis on overlay errors in manufacturing.

Skills

Scanner metrology

Overlay measurement techniques

Data-driven analysis

Problem-solving skills

Education

Bachelor’s or Master’s degree in Engineering

Tools

KLA metrology tools

Python

MATLAB

Job description

Senior Photo Process Engineer – Scanner Metrology

The Senior Photolithography Scanner Metrology Engineer develops, implements, and optimizes advanced metrology solutions to enable world‑class lithography performance. This role focuses on overlay measurement, alignment accuracy, and scanner‑metrology interaction to ensure precise pattern placement critical to advanced DRAM manufacturing.

Responsibilities

• Develop, optimize, and sustain scanner metrology solutions supporting advanced photolithography processes
• Drive improvements in overlay performance, alignment accuracy, and process control using data‑driven analysis
• Utilize KLA metrology systems and diffraction‑based overlay techniques to monitor and improve lithography performance
• Partner with process, equipment, and integration teams to troubleshoot and resolve overlay and alignment issues
• Perform root cause analysis on overlay errors, tool matching challenges, and process variability while improving SPC metrics

Minimum Qualifications

• 5+ years of semiconductor industry experience focused on scanner metrology, overlay, or lithography metrology systems
• Hands‑on experience with KLA metrology tools and overlay measurement techniques, including diffraction‑based overlay
• Strong understanding of alignment and overlay fundamentals in advanced photolithography
• Experience troubleshooting overlay or metrology issues in a fab or manufacturing environment
• Bachelor’s or Master’s degree in Engineering or a related technical field, equivalent military experience, or an AAS with 5+ years of relevant experience
• Willingness to travel internationally for onboarding and training

Preferred Qualifications

• Deep knowledge of lithography–metrology interaction, including scanner alignment, overlay budgets, and process‑induced variability
• Experience working in high‑volume manufacturing environments
• Strong analytical and problem‑solving skills with a meticulous, data‑driven approach
• Familiarity with advanced metrology techniques such as optical overlay, scatterometry, or CD metrology
• Experience with SPC, fault detection, data analytics tools, or programming and data science platforms such as Python, JMP, or MATLAB

Job Profile(s)

• Semiconductor Process Engineer 2 – Semiconductor Process Engineer 3

Equal Employment Opportunity

Micron is proud to be an equal opportunity workplace and is an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity or any other factor protected by applicable federal, state, or local laws.