Senior Lithography Metrology Engineer – Overlay Expert

Micron Technology, Inc

Boise (ID)

On-site

USD 85,000 - 105,000

Full time

14 days+
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Job summary

Micron Technology, Inc in Boise, Idaho, is seeking a Senior Photo Process Engineer to develop and optimize advanced metrology solutions for world-class lithography performance. The role involves overlay measurement and alignment accuracy to ensure precise pattern placements critical to advanced DRAM manufacturing.

The successful candidate will have over 5 years in semiconductor industry experience, focusing on scanner metrology and overlay techniques, alongside a Bachelor's or Master's degree in Engineering or a related field. International travel for onboarding and training may be required.

Qualifications

  • 5+ years of semiconductor industry experience focused on scanner metrology.
  • Hands-on experience with KLA tools and diffraction-based overlay techniques.
  • Bachelor’s degree or equivalent military experience in a relevant field.

Responsibilities

  • Develop and sustain scanner metrology solutions for photolithography.
  • Drive improvements in overlay performance and alignment accuracy.
  • Perform root cause analysis on overlay errors in manufacturing.

Skills

Scanner metrology
Overlay measurement techniques
Data-driven analysis
Problem-solving skills

Education

Bachelor’s or Master’s degree in Engineering

Tools

KLA metrology tools
Python
MATLAB

Job description

Micron Technology, Inc in Boise, Idaho, is seeking a Senior Photo Process Engineer to develop and optimize advanced metrology solutions for world-class lithography performance. The role involves overlay measurement and alignment accuracy to ensure precise pattern placements critical to advanced DRAM manufacturing.

The successful candidate will have over 5 years in semiconductor industry experience, focusing on scanner metrology and overlay techniques, alongside a Bachelor's or Master's degree in Engineering or a related field. International travel for onboarding and training may be required.

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