Postdoctoral Beamline Scientist: EUV Reflectometry & Optics

Johns Hopkins University; Gaithersburg (MD); On-site; USD 70,000 - 90,000; Full time

Job summary

Johns Hopkins University is seeking a PREP Research Associate based in Gaithersburg, Maryland. The role involves conducting research while collaborating with multidisciplinary teams at NIST to support the EUV lithographic community.

Candidates must possess a Ph.D. in relevant fields and have experience with optical metrology and beamline operations. Strong communication skills are essential. The project promotes innovative research and systemic advancements in lithography.

Qualifications

• Ph.D. in physics, Engineering, or a related field.
• Experience with optical metrology instrument and detector design.
• Experience with EUV lithography and synchrotron beamline operations.

Responsibilities

• Conduct literature review of EUV multilayer mirror technology.
• Operate, maintain, and upgrade beamline 7.
• Develop roadmap for EUV reflectometry reference standard.
• Interact with staff to design components using CAD software.

Skills

Optical metrology instrument and detector design

EUV lithography

Synchrotron beamline operations

Ultra-high vacuum systems and practices

X-ray and/or EUV instruments

Data acquisition hardware and software (LabVIEW and Python)

CAD software

Statistical data analysis

Education

Ph.D. in physics, Engineering, or a related field

Job description

Johns Hopkins University is seeking a PREP Research Associate based in Gaithersburg, Maryland. The role involves conducting research while collaborating with multidisciplinary teams at NIST to support the EUV lithographic community.

Candidates must possess a Ph.D. in relevant fields and have experience with optical metrology and beamline operations. Strong communication skills are essential. The project promotes innovative research and systemic advancements in lithography.