Part-Time Maintenance Technician – Kapolei

Integrated Facility Services Hawaii; Honolulu (HI); On-site; USD 25,000 - 36,000; Part time

Benefits offered by this job

Free employee-only basic medical

Health, dental, and vision insurance

Paid time off

Paid holidays

401k Retirement Fund with Company

Free cancer insurance

Employee referral program

Professional development

Supportive and collaborative work env

Job summary

Integrated Facility Services Hawaii seeks a part-time Maintenance Technician in Kapolei to perform janitorial and light maintenance duties. The role emphasizes reliability, punctuality, and a collaborative attitude in a fast-paced site management setting.

The position offers competitive wages and benefits, with a schedule of Monday and Wednesday 8am–11am and Friday 8am–12pm. Training and advancement opportunities are available for dedicated staff.

Qualifications

• Maintenance staff must have problem-solving and communication skills.
• Strong willingness to learn and a variety of other skills are considered.
• Candidates without experience will be considered if they have a strong willingness to learn.

Responsibilities

• Maintain a clean, organized work environment per House Rules and Employee Policy Manual.
• Complete the Daily Maintenance Job List & Log Form and any assigned tasks.
• Perform basic cleanup with equipment like vacuum and buffer.
• Support site residents and management with timely, safe tasks.

Skills

Problem solving

Communication

Punctuality

Reliability

Teamwork

Attention to detail

Tools

Vacuum

Buffer

Job description

Integrated Facility Services Hawaii seeks a part-time Maintenance Technician in Kapolei to perform janitorial and light maintenance duties. The role emphasizes reliability, punctuality, and a collaborative attitude in a fast-paced site management setting.

The position offers competitive wages and benefits, with a schedule of Monday and Wednesday 8am–11am and Friday 8am–12pm. Training and advancement opportunities are available for dedicated staff.