MOCVD Process Engineer Intern — Data-Driven Growth

Lumentum Operations LLC; Greensboro (NC); On-site; USD 20,000 - 27,000; Full time

Job summary

Lumentum Inc. in Greensboro, NC is offering an internship with the Epitaxy Manufacturing and Engineering teams to optimize semiconductor growth processes and bridge theory with practical factory automation.

You will assist in automation, perform metrology measurements (PL, XRD), and help draft SOPs for process control while applying data analysis to improve yield and wafer uniformity.

Qualifications

• Currently enrolled in a Master’s or PhD degree program in semiconductor, electrical, optical, physical or a related major.
• Foundational knowledge of concepts, tools, or methods relevant to the internship.
• Demonstrated ability to apply classroom learning through coursework, projects, laboratory work, research, or other relevant experience.

Responsibilities

• Process Automation & Development: Assist in developing automated recipe adjustment workflows using metrology outputs to create data-driven logic for automatic process corrections.
• Metrology & Characterization: Perform engineering measurements and analyses, including defect analysis, PL and XRD to evaluate epitaxial layer quality.
• Documentation & Standard Work: Draft and update SOPs for MOCVD process control and troubleshooting.
• Data Analysis: Use statistical methods to correlate metrology data with reactor performance to identify yield trends.

Skills

Foundational knowledge

Technical writing

Physics fundamentals

Epitaxy familiarity

Education

Master’s or PhD candidate in semiconductor/related field

Tools

MBE

MOCVD

XRD

PL

Job description

Lumentum Inc. in Greensboro, NC is offering an internship with the Epitaxy Manufacturing and Engineering teams to optimize semiconductor growth processes and bridge theory with practical factory automation.

You will assist in automation, perform metrology measurements (PL, XRD), and help draft SOPs for process control while applying data analysis to improve yield and wafer uniformity.