Industrial Hygiene Lead – Safety & Compliance (Onsite)

Clarios, LLC; Toledo (OH); Sur place; USD 90 000 - 120 000; Plein temps

Avantages offerts par ce poste

Medical benefits

401(k) with match

Tuition reimbursement

Résumé du poste

Clarios, LLC is seeking a seasoned Industrial Hygiene professional for its Toledo, OH plant. The role is onsite five days a week with about 10% travel, focused on monitoring and improving employee health risks across manufacturing operations.

You will implement IH programs, partner with Health & Safety, HR, and Plant Leadership, and drive regulatory compliance and continuous improvement in IH metrics. A Bachelor's or CIH is preferred, with minimum 3 years in IH in manufacturing.

Qualifications

• Bachelor's degree in Industrial Hygiene or related field required.
• Minimum 3 years of experience in industrial hygiene, preferably in manufacturing.
• Proficient knowledge of OSHA, ACGIH or equivalent organizations.
• Knowledge of applicable laws, policies and procedures.

Responsabilités

• Lead industrial hygiene programs to monitor and improve employee health risks on site.
• Develop strategies to reduce exposure through ventilation, PPE, and engineering controls.
• Maintain records and reports per legal, government and corporate standards.
• Educate plant personnel on industrial hygiene best practices and compliance.

Connaissances

Industrial Hygiene

OSHA knowledge

ACGIH knowledge

Manufacturing experience

Formation

Bachelor's degree in Industrial Hygiene

Graduate degree or CIH

Description du poste

Clarios, LLC is seeking a seasoned Industrial Hygiene professional for its Toledo, OH plant. The role is onsite five days a week with about 10% travel, focused on monitoring and improving employee health risks across manufacturing operations.

You will implement IH programs, partner with Health & Safety, HR, and Plant Leadership, and drive regulatory compliance and continuous improvement in IH metrics. A Bachelor's or CIH is preferred, with minimum 3 years in IH in manufacturing.