Hybrid Plasma Etch Process Engineer (I–V)

Hitachi, Ltd.; Hillsboro (OR); Hybrid; USD 67,000 - 185,000; Full time

Job summary

Hitachi, Ltd. in Hillsboro, OR is seeking a Process Engineer I–V to support Reactive Ion Etch processes for advanced semiconductor nodes. You will work hands-on in a hybrid environment, collaborating across teams to deliver process development, optimization, and documentation.

Ideal candidates have plasma etch experience, strong data analysis skills, and the ability to drive multiple projects with limited supervision. Travel is minimal, and onsite presence is required.

Qualifications

• BS or MS in Chemical/Materials/Electrical Engineering, Physics, or equivalent.
• PE V requires BS/MS/PhD in relevant field with experience; PhD plus 5+ years or MS 8+ years, BS 12+ years preferred.
• Experience with plasma etch processes and semiconductor manufacturing equipment is preferred.

Responsibilities

• Perform hands-on process engineering development and evaluation to meet customer requirements.
• Collaborate with cross-functional teams to deliver process improvements and DOE-driven tuning.
• Maintain safety, IP protection, and lab procedures compliance.

Skills

Process engineering

DOE (Design of Experiments)

Statistical analysis

Lab procedures

Cross-team collaboration

Education

BS in Chemical/Materials/Electrical Engineering or related

MS in Chemical/Materials/Physics or related (PE V path)

PhD (PE V path)

Tools

Hitachi plasma etch systems

Metrology equipment

Job description

Hitachi, Ltd. in Hillsboro, OR is seeking a Process Engineer I–V to support Reactive Ion Etch processes for advanced semiconductor nodes. You will work hands-on in a hybrid environment, collaborating across teams to deliver process development, optimization, and documentation.

Ideal candidates have plasma etch experience, strong data analysis skills, and the ability to drive multiple projects with limited supervision. Travel is minimal, and onsite presence is required.