Equipment Maintenance Intern (Metrology) – Paid Tuition

Microchip Technologies; Gresham (OR); On-site; USD 25,000 - 30,000; Part time

Benefits offered by this job

Paid internship

Tuition reimbursement

Job summary

Microchip Technology Inc in Gresham, Oregon is hiring an Equipment Maintenance Technician Intern (Metrology) at our Fab 4 facility. This paid internship covers tuition and required books for students in relevant programs and offers a path to full-time opportunities upon completion.

Interns will learn semiconductor equipment maintenance, work at least 24 hours per week, and balance class schedules with an engaging hands-on experience in a fast-paced environment with potential for future

Qualifications

• Currently enrolled in Microelectronics, Mechatronics, Electronics Engineering Technology, or other approved AAS programs.
• Ability to work two 12-hour shifts in a fast-paced cleanroom environment during the school year.
• Ability to apply theory to practical, real-world applications.
• Strong organization, documentation, writing skills.

Responsibilities

• Read and navigate schematics and use test equipment for calibration and repair.
• Disassemble, adjust and repair equipment per maintenance specs and OEM manuals.
• Use diagnostics to monitor performance and suggest reliability improvements.
• Work safely around systems with hazards and communicate findings clearly.

Skills

Problem solving

Communication

Documentation

MS Office

Education

AAS program in Microelectronics/Mechatronics

Tools

Unix/Linux

MS Office

Job description

Microchip Technology Inc in Gresham, Oregon is hiring an Equipment Maintenance Technician Intern (Metrology) at our Fab 4 facility. This paid internship covers tuition and required books for students in relevant programs and offers a path to full-time opportunities upon completion.

Interns will learn semiconductor equipment maintenance, work at least 24 hours per week, and balance class schedules with an engaging hands-on experience in a fast-paced environment with potential for future