EO/IR Systems Engineer Specialist - DoD Clearance Eligible

Jobtome

Cuba (MO)

On-site

USD 110,000 - 150,000

Full time

3 days ago
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Job summary

L3Harris Technologies in Mason, Ohio seeks a Specialist Systems Engineer to support IR sensor programs. You will serve as technical lead or part of a team across planning, design, analysis, integration, and verification for EO/IR systems.

The role requires a Bachelor’s in engineering or higher with 4+ years experience (or 8 years without degree) and the ability to obtain a DoD security clearance; it offers an on-site schedule with a 9/80 work pattern and collaboration across a high-performing

Qualifications

  • Bachelor’s degree or higher in an engineering discipline with 4+ years of relevant experience; or 2+ years with a Graduate Degree.
  • In lieu of a degree, minimum 8 years of relevant experience.
  • Experience in EO/IR sensor systems is preferred.

Responsibilities

  • Lead or support technical planning, system integration, validation, and verification activities.
  • Perform analyses across concept to disposal lifecycle; assess performance vs goals.
  • Support across the system development lifecycle; collaborate with customers, suppliers and leadership.
  • Must be able to obtain a DoD security clearance.

Skills

EO/IR sensor systems
Systems engineering
Technical planning
System integration
Verification & validation
Decision making
DoD clearance eligibility

Education

Bachelor’s degree in Electrical, Electronics, Computer, Physics, or related Engineering discipline
Graduate Degree in related field

Job description

L3Harris Technologies in Mason, Ohio seeks a Specialist Systems Engineer to support IR sensor programs. You will serve as technical lead or part of a team across planning, design, analysis, integration, and verification for EO/IR systems.

The role requires a Bachelor’s in engineering or higher with 4+ years experience (or 8 years without degree) and the ability to obtain a DoD security clearance; it offers an on-site schedule with a 9/80 work pattern and collaboration across a high-performing

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