DRAM Dry Etch Pathfinding Intern — Process Innovation

Micron; Boise (ID); On-site; USD 34,000 - 55,000; Full time

Benefits offered by this job

Medical/Dental/Vision plans

Paid time off

Paid holidays

Flexible benefits

Job summary

Micron Technology in Boise, Idaho is seeking a DRAM Dry Etch Process Pathfinding Intern to contribute to advanced plasma etch research for next‑generation memory products. You will work with experienced engineers, gain hands-on experience with dry etch equipment, and support data‑driven problem solving in a fast‑ paced lab environment.

You will apply analytical methods, document results, and collaborate across teams while learning about vacuum systems, RF/plasma science, and semiconductor

Qualifications

• Currently pursuing a Master’s or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or a related field; exceptional undergraduates may be considered.
• Graduation date after September 2027.
• Academic or practical experience in vacuum systems, RF/plasma science, chemistry, or semiconductor processing equipment.
• Demonstrated ability to analyze technical data and communicate findings through written reports or presentations.

Responsibilities

• Conduct experiments and fundamental research to develop innovative dry etch solutions for next‑generation memory technologies.
• Partner with the Pathfinding team to develop and optimize dry etch processes that meet physical and electrical performance requirements.
• Apply analytical, statistical, and problem‑solving methods to evaluate process performance, hardware capability, and process capability, and aid in resolving problems.
• Demonstrate a Safety First approach in all laboratory, fabrication, and collaborative work environments while effectively communicating technical results and recommendations.
• Leverage AI and digital tools to accelerate data analysis, technical learning, documentation, and process development activities.

Skills

Data analysis

Data visualization

Technical reporting

Presentation skills

Education

Master's or PhD in Materials Science/Physics/Chemistry/Chemical Engineering

Tools

Vacuum systems

RF/plasma equipment

Semiconductor processing equipment

Job description

Micron Technology in Boise, Idaho is seeking a DRAM Dry Etch Process Pathfinding Intern to contribute to advanced plasma etch research for next‑generation memory products. You will work with experienced engineers, gain hands-on experience with dry etch equipment, and support data‑driven problem solving in a fast‑ paced lab environment.

You will apply analytical methods, document results, and collaborate across teams while learning about vacuum systems, RF/plasma science, and semiconductor