Senior Photolithography Tech Lead, NAND Process Innovation

1100 Micron SemiAsiaOP Pte Ltd

Singapore

On-site

SGD 120,000 - 180,000

Full time

14 days+
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Job summary

1100 Micron SemiAsiaOP Pte Ltd in Singapore is seeking a Technical Leadership Program member to define and lead advanced photolithography technologies. This role influences development strategies, mentors engineers, and drives innovation across teams.

The ideal candidate has a PhD or Master's degree with extensive experience in semiconductor photolithography, recognized as an advanced imaging authority. The position focuses on technology vision, mentorship, and integrating AI tools.

Qualifications

  • PhD ≥12 years experience, or Master’s ≥15 years experience, in Electrical Engineering, Materials Science, Chemical Engineering, Physics, or related field.
  • Recognized advanced imaging authority.

Responsibilities

  • Lead pathfinding initiatives for future nodes and architectures.
  • Establish long-term technology vision, defining long-term photolithography process and equipment technology roadmaps.
  • Mentor next-generation technical leaders.
  • De-risk novel lithography concepts and platforms.

Skills

Advanced proficiency in photolithography process and equipment roadmaps
Advanced knowledge in optics
Multi-node, Multi-site program leadership
Advanced proficiency in lithography simulation tools

Education

PhD with ≥12 years experience or Master's with ≥15 years experience in relevant fields

Tools

Metrology tools
Lithography simulation tools

Job description

1100 Micron SemiAsiaOP Pte Ltd in Singapore is seeking a Technical Leadership Program member to define and lead advanced photolithography technologies. This role influences development strategies, mentors engineers, and drives innovation across teams.

The ideal candidate has a PhD or Master's degree with extensive experience in semiconductor photolithography, recognized as an advanced imaging authority. The position focuses on technology vision, mentorship, and integrating AI tools.

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