Principal Process Engineer: Advanced Plasma & Simulation

KLA-Belgium

United Kingdom

On-site

GBP 90,000 - 130,000

Full time

2 days ago
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Benefits offered by this job

Annual leave 25 days + bank holidays
Share scheme
Contributory pension
Cash health plan
Cycle to work

Job summary

KLA in the United Kingdom seeks a Principal Process Engineer to lead advanced plasma etch development, optimisation, and modelling. You will drive cross-functional collaboration with hardware, software, NPI and manufacturing teams to improve production performance.

A MSc/PhD in Engineering or related field is preferred; experience with COMSOL/ANSYS and DOE is highly valued. Occasional travel to customer sites and conferences may be required.

Qualifications

  • Ideally MSc/PhD in Engineering, Materials Science, Physics, or related field.
  • Experience with semiconductor processes, plasma modelling, or CFD is advantageous.
  • Strong numerical and analytical skills with DOE methods.

Responsibilities

  • Lead development and qualification of advanced plasma process technologies.
  • Develop and validate simulation models for complex systems.
  • Perform CFD, plasma, thermal, electromagnetic, or multi-physics modelling.
  • Interface with customers for demos, qualifications, and issue resolution.
  • Lead RCA for reliability issues.

Skills

Semiconductor equipment
DOE & statistics
Plasma etch knowledge
CFD / multi-physics
Python / MATLAB / OpenFOAM
Data-driven mindset

Education

MSc/PhD in Engineering, Materials Science, Physics, or related field

Tools

COMSOL
ANSYS
MATLAB/Simulink
OpenFOAM
Python

Job description

KLA in the United Kingdom seeks a Principal Process Engineer to lead advanced plasma etch development, optimisation, and modelling. You will drive cross-functional collaboration with hardware, software, NPI and manufacturing teams to improve production performance.

A MSc/PhD in Engineering or related field is preferred; experience with COMSOL/ANSYS and DOE is highly valued. Occasional travel to customer sites and conferences may be required.

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