Senior Lithography & Optical Imaging Engineer

Nearfield Instruments; United States; On-site; USD 130,000 - 195,000; Full time

Job summary

Nearfield Instruments is seeking a Senior Application Engineer in Lithography and Optical Imaging to advance metrology and process control solutions. You will develop imaging models, optimize scanner performance, and apply EUV mask characterization at a high level.

You will collaborate with system architects and engineers to deploy innovations in our high-throughput metrology systems for leading chipmakers, leveraging deep domain expertise and a fast-paced R&D environment.

Qualifications

• PhD or MSc in Physics, Optical Engineering, Electrical Engineering, or related field.
• Deep expertise in optical imaging, EUV lithography, and scanner performance optimization.
• Proven experience in EUV mask, scatterometry, and resist characterization.
• Ability to bridge lithography knowledge with metrology and process control applications.
• 5+ years of industry or advanced academic research experience in semiconductor lithography, optical metrology, or related domains.
• Strong analytical and problem-solving skills, with the ability to work across disciplines in a fast-paced R&D environment.

Responsibilities

• Develop and optimize optical imaging models and techniques for use in advanced metrology and inspection.
• Translate scanner performance knowledge (CDU, focus, overlay, aberrations, imaging limits) into innovative process control solutions.
• Apply expertise in (High-NA) EUV mask characterization, including 3D feature metrology (absorber CD, sidewall angle, height) and resist behavior under EUV and out-of-band light exposure.
• Advance methods such as scatterometry and computational imaging to push the limits of in-line process control.
• Collaborate with system architects, AFM/imaging experts, and software engineers to integrate imaging innovations into our commercial systems.
• Work with leading global semiconductor fabs to validate and deploy solutions in high-volume manufacturing environments.

Skills

Optical imaging

EUV lithography

Scanner performance

Scatterometry

Resist characterization

Metrology

Process control

Education

PhD in Physics/Optical Engineering

MSc in related field

Job description

Nearfield Instruments is seeking a Senior Application Engineer in Lithography and Optical Imaging to advance metrology and process control solutions. You will develop imaging models, optimize scanner performance, and apply EUV mask characterization at a high level.

You will collaborate with system architects and engineers to deploy innovations in our high-throughput metrology systems for leading chipmakers, leveraging deep domain expertise and a fast-paced R&D environment.