Plasma Etch Process Engineer — Drive Process Innovation
Tokyo Electron US
City of Albany (NY)
On-site
USD 67,979 - 96,098
Full time
14 days+
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Benefits offered by this job
Comprehensive benefits package
Bonus plan eligibility for certain roles
Job summary
Tokyo Electron US is hiring for the position of Process Engineer I, II or III in Albany, NY. This role involves supporting the development and improvement of plasma etch processes alongside executing optimization projects. Candidates are expected to have a Bachelor's degree in a relevant engineering field. Depending on rank, 0 to 5 years of relevant experience is required. The company provides a competitive salary range between $67,979.86 and $96,098.86, plus a comprehensive benefits package.
Qualifications
No experience necessary but previous experience or relevant internship preferred.
2 years of relevant experience for Process Engineer II.
5 years of relevant experience for Process Engineer III.
Responsibilities
Develop new or modified process formulations.
Lead development and implementation of process modifications.
Evaluate and implement new technologies.
Mentor junior engineers.
Skills
Basic understanding of semiconductor or hardware manufacturing processes
Familiarity with process development
Good communication and teamwork skills
Detail-oriented and analytical mindset
Proficient in statistical process control
Project management skills
Leadership and coaching skills
Education
Bachelor’s degree in engineering, Chemistry, Materials Science, or related field
Job description
Tokyo Electron US is hiring for the position of Process Engineer I, II or III in Albany, NY. This role involves supporting the development and improvement of plasma etch processes alongside executing optimization projects. Candidates are expected to have a Bachelor's degree in a relevant engineering field. Depending on rank, 0 to 5 years of relevant experience is required. The company provides a competitive salary range between $67,979.86 and $96,098.86, plus a comprehensive benefits package.