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The Material Measurement Laboratory at the National Institute of Standards and Technology (NIST) seeks qualified U.S. citizens to join a team within the CHIPS Nanometer-Scale Planar Reference Materials project.
You will apply advanced X-ray and optical metrology to map properties of thin films on Si and SiC wafers. The position, for one year with renewal options, involves developing structural maps, performing sample preparation, and publishing results in journals.
The Material Measurement Laboratory of the National Institute of Standards and Technology (NIST) is seeking qualified persons (U.S. citizens preferred) to join a team of researchers within the NIST/CHIPS Nanometer-Scale Planar Reference Materials project working with advanced metrology methods to characterize local physical and chemical properties and map any variation in these properties of thin, nanometer-scale films deposited on Si (and SiC) wafers. The candidate will measure and analyze these wafers using X-ray and optical methods to determine, through hybrid metrology, structural maps for wafers with thin films of interest to the semiconductor community.
This opportunity is for an associate researcher in the NIST Materials Measurement Science Division for a term of one year, with options to renew. Associate researchers are NOT Federal Employees, but they work along with NIST researchers and with NIST’s world-class instrumentation. Relocation expenses will not be provided. U.S. citizens hired into associate positions may have the opportunity to seek longer term Federal Employment.