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A leading company in semiconductor technology is seeking a Plasma Etch Process Development Engineer. This critical role focuses on designing and optimizing plasma etch processes for cutting-edge DRAM and NVM products, requiring a PhD and extensive experience in dry etch development. Candidates will manage projects and collaborate to ensure robust processes meet stringent requirements, contributing significantly to product success.
As a Plasma Etch Process Development Engineer in the Dry Etch Research and Development Group at Micron Technology, Inc., you will design and optimize plasma etch processes for Micron's leading edge DRAM and NAND/NVM Flash products. Your role involves taking ideas from conception through process development to implementation in our production facilities. You will also manage highly technical projects. This role is critical to Micron's product success and may require travel to manufacturing sites.
Primary responsibilities include plasma dry etch process characterization, optimization, design, troubleshooting, process transfer, and fundamental research. You will collaborate with process integration, electrical failure analysis, yield enhancement, manufacturing, and equipment vendors to ensure robust etch processes meeting physical and electrical requirements.
As a Principal Engineer – Dry Etch – NVM, travel for business purposes is required. Candidates should have an R&D aptitude, strong organizational skills, and the ability to work independently or in teams. Weekend support may be necessary for manufacturing line issues and monitoring program lots.
Your responsibilities will include, but are not limited to:
Qualifications include a PhD in Engineering or Science with over 7 years of relevant Dry Etch process development experience.
Successful candidates must have: