Lead / Principal Research Engineer (Lithography) (APM), IME

Job Description:

1. Leading central lithography team under pattern transfer group.
2. Selection, procurement, and qualification of litho tool sets based on program -- from contact aligner to immersion.
3. Actively working with cross-functional stakeholders to plan and develop new lithography processes.
4. Validate design, reticle tap out, and post tap out verification.
5. Assist in internal and external technical discussions to overcome process-related challenges and provide relevant solutions.
6. Perform process characterization and margin studies to determine the process capability of new process platforms.
7. Act as a subject matter expert and resource for researchers and industry partners to enable process and/or product realization.
8. Publish process development outcomes and breakthroughs in the research community.
9. Engage with relevant equipment makers/vendors and be responsible for selecting and procuring research equipment.
10. Work with fab team in establishing SPC for newly developed processes.

Requirements:

1. Ph.D/Master/Bachelor Degree in Materials Science, Electrical Engineering, Chemical Engineering, Physics, Chemistry, and Microelectronics, or closely related fields are welcome to apply.
2. More than 10 years of relevant working experience in R&D and/or industry environment with broad exposure in handling 6”, 8” and/or 12” substrates covering nano to micron tech nodes, preferably experience in SiC/GaN/Photonics.
3. Proficient in Photolithography tools including Immersion/KrF/I-line Scanner/Stepper/Mask Aligner; knowledge in EBEAM Lithography tool will be an added advantage.
4. Hands-on experience in metrology including but not limited to CDSEM, Overlay, OCD, DRSEM, Microscope. Capable of creating recipes to support various research requirements.
5. Knowledge in design and simulation (Prolith, OPC, etc.), reticle layout (oas, gds) review, and basic tap out process.
6. Equipped with Lithography skill set including fundamental Lithography theory, Photoresist characteristics and applications, new process setup (swing curve, FEM, DOE, statistical root cause analysis, and problem-solving methods, etc.), optimization, and margin improvement.
7. Relevant hardware and application knowledge in Lithography tools and metrology.
8. Possess good interpersonal and oral/written communication skills, with the ability to deliver clear and concise messages to both internal and external stakeholders.