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ARCNL in Amsterdam, Netherlands, invites applications for a postdoc position to generate extreme ultraviolet light from laser-generated plasma using a 2µm laser. This experiment-oriented role sits in ARCNL’s Source Department and focuses on fundamental physics with industrial relevance to EUV lithography.
You will design and execute experiments, work with cutting-edge laser technologies, and join an interdisciplinary team of PhD students and postdocs to uncover optimal plasma conditions and
ARCNL - Advanced Research Center for Nanolithography
Amsterdam, Netherlands
From € 4,552 per month gross
This experiment-oriented postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.
To identify what light source will power the next generation of lithography machines, we need to understand what plasma conditions are optimal for producing light from plasma, but also we need to understand how such plasma should be generated, and what laser technology should be used. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate.