PhD - student: Generating short-wavelength radiation from plasma

Rotterdam School of Management, Erasmus University (RSM); Amsterdam; On-site; EUR 40.000 - 60.000; Full time

Job summary

A leading research institution in the Netherlands is offering a fully funded PhD position focused on EUV plasma processes. The position requires an MSc in Physics and involves designing experiments to improve light generation from plasma. Candidates should have strong laboratory skills and be proficient in Python. This role offers generous employment benefits and support for international PhD candidates.

Benefits

State-of-the-art equipment

Collaboration with industry partners

Opportunities to present at conferences

Housing and visa support for international students

Qualifications

• MSc degree in (Applied) Physics required.
• Knowledge of experimental laser physics preferred.
• Hands-on laboratory skills are an asset.

Responsibilities

• Design and execute experiments to understand plasma light emission.
• Work on advanced laser technologies.
• Collaborate within an interdisciplinary team.

Skills

Experimental laser physics

Plasma and fluid mechanics

Programming in Python

Strong verbal and written communication skills in English

Education

MSc degree in (Applied) Physics

Job description

Work Activities

This fully funded PhD position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

In our group’s research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms. Nature Commun. 11, (2020)], found a universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133, (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev. Appl. 20, (2023)], and work on an alternative EUV source solution [Mostafa, Appl. Phys. Lett. 123, (2023)].

Background

The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses. At ARCNL, we are now thinking about the next generation of light sources: Can we make more efficient and more powerful EUV sources? Is it possible to make light sources that emit radiation efficiently at even shorter wavelengths?

Project goal

To identify what light source will power the next generation of lithography machines, we need to understand what plasma conditions are optimal for producing light from plasma, but also we need to understand how such plasma should be generated, and what laser technology should be used. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate.

Qualifications

• You have (or will soon obtain) an MSc degree in (Applied) Physics
• Knowledge of experimental laser physics and/or plasma and fluid mechanics is an asset, especially if combined with strong hands-on laboratory skills
• Programming experience, particularly in Python, is welcomed
• Strong verbal and written communication skills in English are required

Work environment

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (UG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff.

Working conditions

ARCNL offers you:

• Responsibility over a setup including state-of-the-art droplet generators and laser systems
• The ability to improve your experimental skills in extensive experimental campaigns that can be designed with a lot of freedom
• Collaboration with the in-house theory group, allowing you to understand the EUV-emitting plasma through radiation-hydrodynamics simulations
• Large amount of (image) data and a wide range of existing data analysis tools, allowing you to apply and develop your data analysis skills
• Cooperation within a large team of PhD- students and postdocs and with a large industrial partner
• The opportunity to show your work at (international) conferences for industry and academia

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2,968 per month, with annual increases throughout the term of employment, as well as a range of employment benefits including a high-end laptop. After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

More information?

For further information about the position, please contact Oscar Versolato:

Dr. Oscar Versolato
Group leader EUV Plasma Processes
E-mail: [e-mail]
Phone: [phone]

Application

You can respond to this vacancy online via the button below.

Please send your:

• Resume
• Motivation letter on why you want to join the group (max. 1 page)

There is no deadline for the vacancy which will stay open until it is filled. The first shortlist of candidates is expected to be drafted approximately in December 2025.

Diversity code

ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.