Process Engineer, Photomask Inspection

Micron

Boise (ID)

On-site

USD 110,000 - 140,000

Full time

3 days ago
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Benefits offered by this job

Medical/dental/vision plans
Paid time off
Competitive compensation

Job summary

Micron Technology Center (MTC) is seeking a Photomask Inspection/Process Engineer to start up, optimize, and sustain reticle inspection and related processes. You will advance EUV inspection, ADC development, and data analysis to support reticle and lithography roadmaps.

You will collaborate across R&D, FEOL, HVM, and manufacturing to diagnose issues, drive yield, and implement AI-assisted improvements with a focus on zero defects and robust quality control.

Qualifications

  • Bachelor's degree in Engineering, Physics, Optics, or Mathematics.
  • 2+ years of reticle pattern inspection or wafer inspection experience.
  • Experience optimizing inspection sensitivities and ADC systems.

Responsibilities

  • Start up, develop, optimize, and sustain photomask inspection processes (reticle pattern, EUV, ADC).
  • Diagnose and resolve process-related manufacturing issues using systematic methods (FMEA, RCA).
  • Lead continuous yield improvement, cost reduction, and efficiency initiatives; improve KPIs.
  • Monitor tool health, SPC performance, and respond to trends/OOS conditions.
  • Research and qualify new inspection processes and models for roadmaps.
  • Collaborate with R&D, FEOL, HVM, manufacturing, and engineering teams for defect analysis.
  • Engage with suppliers to evaluate and improve equipment, ADC algorithms, and inspection capabilities.

Skills

Reticle inspection
ADC systems
Data analysis
Problem solving

Education

Bachelors in STEM

Tools

ADC software
AI tools

Job description

Our vision is to transform how the world uses information to enrich life for all .

Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.

As a Photomask Inspection Engineer / Process Engineer at Micron Technology Center (MTC), you will be responsible for starting up, developing, optimizing, and sustaining reticle inspection and inspection-related processes to ensure the highest levels of product quality, reliability, yield, cost efficiency, and risk management. This role focuses on EUV reticle pattern inspection, Automatic Defect Classification (ADC), defect avoidance, continuous improvement, and advanced data analysis in support of Micron's reticle and lithography roadmaps.

Responsibilities
  • Start up, develop, optimize, and sustain photomask inspection processes including reticle pattern inspection, EUV inspection, ADC, defect avoidance, and inspection sensitivity tuning to ensure zero printing defects and shipment errors
  • Identify, diagnose, and resolve process-related manufacturing issues using systematic problem-solving methodologies such as Failure Analysis, FMEA, 8D, MBPS, RCA, SPC/FDC, and statistical data analysis
  • Lead and participate in continuous yield improvement, cost reduction, productivity improvement, automation, and efficiency initiatives to improve KPIs such as First Time Success Rate, nuisance/false alarm reduction, equipment availability, and RPT
  • Monitor tool health, SPC performance, inspection results, and respond to trends or out-of-spec (OOS) process and equipment conditions
  • Research, develop, implement, and qualify new inspection processes, techniques, sensitivities, models, and baselines to support Micron's reticle, EUV, pellicle, and High-NA lithography roadmaps
  • Collaborate closely with R&D, FEOL, HVM, sustaining engineering, manufacturing, and inspection process/equipment engineering teams to support defect analysis, printability assessment (including Actinic images and WPC), and data-driven decision making
  • Engage with inspection tool, software, equipment, and material suppliers to evaluate, qualify, audit, and improve current and next-generation capital equipment, ADC algorithms, materials, and inspection capabilities while meeting quality, cost, ROI, and risk objectives
  • Provide technical leadership by mentoring and training manufacturing personnel and engineers. Offer authoritative insight into tool and process capabilities and appropriate data collection techniques. Use AI tools to improve efficiency.
Minimum Qualifications
  • Bachelor's degree or higher in Engineering, Physics, Optics, or Mathematics
  • Minimum of 2+ years of experience in reticle pattern inspection or wafer inspection (RDA)
  • Experience optimizing inspection sensitivities to ensure defect detection and zero printing defects
  • Experience developing, tuning, and optimizing ADC (Automatic Defect Classification) systems and algorithms
  • Strong competency in systematic problem-solving techniques (e.g., MBPS, RCA) with excellent written and verbal communication skills and ability to work with limited guidance
Preferred Qualifications
  • EUV reticle inspection experience
  • Experience qualifying new capital equipment and next-generation inspection tools
  • Experience applying AI or advanced analytics to improve inspection efficiency and effectiveness
Benefits
  • We offer a choice of medical, dental and vision plans in all locations enabling team members to select the plans that best meet their family healthcare needs and budget.
  • Micron also provides benefit programs that help protect your income if you are unable to work due to illness or injury, and paid family leave.
  • Additionally, Micron benefits include a robust paid time-off program and paid holidays.

For additional information regarding the Benefit programs available, please see the Benefits Guide posted on micron.com/careers/benefits .

Micron is proud to be an equal opportunity workplace and is an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity or any other factor protected by applicable federal, state, or local laws.

Micron Prohibits the use of child labor and

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