Postdoctoral Appointee - Atomic Layer Deposition for X-ray Optics Fabrication

Argonne National Laboratory; Lemont (IL); On-site; USD 73,000 - 121,000; Full time

Benefits offered by this job

Comprehensive benefits

Job summary

Argonne National Laboratory seeks a Postdoctoral Appointee in the X-ray Science Division to advance diffractive X-ray optics fabricated by atomic layer deposition. The role involves developing ALD processes, characterizing films, and improving deposition accuracy during extended campaigns.

The appointee will participate in testing diffractive optics at the 1-BM beamline and collaborate across Argonne divisions, driving world-class optics research in a highly collaborative environment.

Qualifications

• Ph.D. in Chemistry, Materials Science and Engineering, Chemical Engineering, Physics, or closely related field completed within 0-5 years.
• Hands-on experience with ALD reactor operation, precursor chemistry, or process development.
• Experience with thin-film materials characterization techniques and electron microscopy for structural analysis.
• Strong record of peer-reviewed publications and good communication skills.

Responsibilities

• Contribute to development and optimization of ALD deposition for thick multilayer structures.
• Characterize film thickness, crystallinity, strain, and optical properties using X-ray techniques and microscopy.
• Design, specify, and commission ALD reactor systems and metrology methods.
• Test and evaluate diffractive optics at the 1-BM beamline and other Argonne beamlines.

Skills

ALD reactor operation

precursor chemistry

process development

thin-film characterization

X-ray optics testing

communication skills

team collaboration

Education

Ph.D. in Chemistry, Materials Science & Engineering, Chemical Engineering, Physics

Tools

ALD reactor

Ellipsometry

X-ray diffraction

Job description

The X-ray Science Division (XSD) at Argonne National Laboratory seeks a Postdoctoral Appointee to contribute to the development of advanced diffractive X-ray optics fabricated by atomic layer deposition (ALD). The successful candidate will develop and optimize ALD processes for the deposition of thick multilayer structures on both flat and patterned substrates, and will characterize film thickness, crystallinity, strain, and optical properties using a broad range of analytical techniques, including X-ray diffraction, X-ray reflectometry, transmission X-ray microscopy, and electron microscopy. Additional responsibilities will include contributing to the specification, design, and commissioning of ALD reactor systems, as well as developing metrology methods to monitor and improve deposition accuracy during extended deposition campaigns. The appointee will also participate in the testing and evaluation of diffractive optics at the 1-BM beamline and possibly other beamlines of the Advanced Photon Source. This position, within the XSD/Optics Group, offers a unique opportunity to work at the forefront of X-ray optics development in a highly collaborative environment, partnering with researchers across multiple Argonne divisions, including the Center for Nanoscale Materials (CNM), the Materials Science Division (MSD), and the Applied Materials Division.

Position Requirements

• Ph.D. in Chemistry, Materials Science and Engineering, Chemical Engineering, Physics, or a closely related field completed within the last 0-5 years.
• Demonstrated hands-on experience with atomic layer deposition (ALD) reactor operation, precursor chemistry, or process development.
• Experience with thin-film materials characterization techniques, such as ellipsometry, reflectometry, or microscopy, as well as electron microscopy techniques (SEM and/or TEM) for structural analysis.
• Strong record of peer-reviewed publications commensurate with career stage.
• Good written and verbal communication skills.
• Ability to work both independently and collaboratively in a multidisciplinary research environment.

Preferred Knowledge, Skills and Experience

• Familiarity with reaction kinetics and chemistry for ALD processes.
• Background in thin-film metrology instrumentation.
• Experience with nanofabrication processes, including lithography, deep reactive-ion etching, or related microfabrication techniques.

Job Family Postdoctoral Job Profile

Postdoctoral Appointee

Employment Type

Long-Term (Fixed Term)

Full time

Salary

The expected hiring range for this position is $72,879.00-$121,465.00. Please note that the pay range information is a general guideline only. The pay offered to a selected candidate will be determined based on factors such as, but not limited to, the scope and responsibilities of the position, the qualifications of the selected candidate, business considerations, internal equity, and external market pay for comparable jobs.

Benefits

Additionally, comprehensive benefits are part of the total rewards package.

Equal Employment Opportunity Statement

As an equal employment opportunity employer, and in accordance with our core values of impact, safety, respect, integrity and teamwork, Argonne National Laboratory is committed to a safe and welcoming workplace that fosters collaborative scientific discovery and innovation. Argonne encourages everyone to apply for employment. Argonne is committed to nondiscrimination and considers all qualified applicants for employment without regard to any characteristic protected by law.

Compliance and Eligibility

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Additional Information

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