PhD Intern: Process Integration & Yield Engineering

Intel Corporation

Hillsboro (OR)

On-site

USD 121,000 - 122,000

Full time

3 days ago
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Benefits offered by this job

Stock bonuses
Health benefits
Vacation

Job summary

Intel Corporation in Hillsboro, Oregon is seeking a PhD intern to contribute to advanced semiconductor manufacturing processes in process integration and yield engineering. You will analyze defect data, run experiments, and support yield improvements in high-volume manufacturing.

Collaborate with engineering teams, apply coursework in electrical/chemical/material sciences, and gain hands-on experience in state-of-the-art facilities.

Qualifications

  • Pursuing a PhD in a semiconductor-related STEM field.
  • Experience with electrical or physical device characterization techniques (I-V/C-V e-test, SEM/TEM) or optical design/simulations.

Responsibilities

  • Analyze defect data to identify trends and recommend process adjustments.
  • Conduct experiments to evaluate process integration flows and optimize equipment configurations.
  • Collaborate with cross-functional engineering teams to troubleshoot process flow issues and enhance metrology strategies.
  • Assist in risk assessments and support yield improvement initiatives.
  • Engage in continuous improvement projects within high-volume manufacturing environments.

Skills

Characterization techniques
Python scripting
Cross-functional collaboration

Education

PhD in Electrical Engineering, Chemical Engineering, Material Science, Physics, Chemistry or semiconductor STEM field

Tools

Python
MATLAB
JSL

Job description

Intel Corporation in Hillsboro, Oregon is seeking a PhD intern to contribute to advanced semiconductor manufacturing processes in process integration and yield engineering. You will analyze defect data, run experiments, and support yield improvements in high-volume manufacturing.

Collaborate with engineering teams, apply coursework in electrical/chemical/material sciences, and gain hands-on experience in state-of-the-art facilities.

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