OT Applications Development Intern: .NET, C#, SQL, Git

Polar Semiconductor, Inc.; BLOOMINGTON (MN); On-site; USD 34,000 - 44,000; Part time

Benefits offered by this job

401(k) plan

Paid time off

Job summary

Polar Semiconductor, Inc. in Bloomington, MN is offering an OT Applications Development Engineer Intern role on-site for 12-13 weeks. The internship focuses on creating and modifying application templates within the OT Applications Development team.

You'll explore RAD, data-layer SQL relationships, SDLC improvements, TFVC to Git migration, and .NET migration while contributing to real projects. Collaboration with engineers is expected and strong communication is required.

Qualifications

• Junior or Senior majoring in Computer Science or Computer Engineering (class list must support an understanding of OOP)
• C# and VB.NET
• Source Control (Git, Azure DevOps TFVC)
• Strong verbal and written communication skills
• Work independently primary; team skills, secondary

Responsibilities

• Investigate rapid application development (RAD) as a complement to primary development
• Examine SQL table relationships as means to the data-layer
• Consider coding methodologies to improve software development life cycle (SDLC)
• Explore Source Control migration from Azure DevOps TFVC to Git
• Inspect .NET Framework to .NET migration
• Other duties, as assigned

Skills

C#

VB.NET

Communication

Independent work

Education

Junior or Senior majoring in Computer Science or Computer Engineering

Tools

Git

Azure DevOps TFVC

SQL basics

Job description

Polar Semiconductor, Inc. in Bloomington, MN is offering an OT Applications Development Engineer Intern role on-site for 12-13 weeks. The internship focuses on creating and modifying application templates within the OT Applications Development team.

You'll explore RAD, data-layer SQL relationships, SDLC improvements, TFVC to Git migration, and .NET migration while contributing to real projects. Collaboration with engineers is expected and strong communication is required.