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Argonne National Laboratory's Nanoscience and Technology Division invites applications for an Assistant Scientist (RD2) in the Nanofabrication and Devices Group within CNM. The successful candidate will lead a microelectronics program, focusing on heterojunction device physics, transport measurements, and nanofabrication.
Responsibilities include collaborating across CNM and Argonne, maintaining cleanroom tools, and supporting external users.
The Nanoscience and Technology Division at Argonne National Laboratory invites applications for an Assistant Scientist (RD2) position in the Nanofabrication and Devices Group within the Center for Nanoscale Materials (CNM). CNM is a U.S. Department of Energy Office of Science user facility that offers world‑class expertise and state‑of‑the‑art instrumentation to enable leading‑edge research in nanoscience and nanotechnology.
We seek a highly motivated scientist to help advance CNM’s research leadership in microelectronics, with particular emphasis on device physics, transport measurements, and nanofabrication. Areas of interest include, but are not limited to, the development of energy‑efficient electronic systems through heterointegration for applications in RF electronics, power electronics, and optoelectronics.
The successful candidate will build and lead an innovative research program in microelectronics by leveraging CNM’s unique strengths in materials synthesis, device fabrication, and characterization. This position offers the opportunity to pioneer new directions in heterointegration and electrical characterization while contributing to CNM’s mission as a national user facility. The role also includes supporting a broad external user community by providing scientific and technical expertise for experiments and operations in CNM’s cleanroom.
The successful candidate will be expected to make full use of CNM’s advanced capabilities and scientific expertise to develop impactful research and support the broader user community.
RD2: Bachelors and 5+ years of experience, Masters and 3+ years, or PhD and 0+ years, or equivalent
Research Development (RD)
Materials/Ceramics/Metallurgical 2
Regular
Full time
The expected hiring range for this position is $94,486.00 - $147,398.94. Please note that the pay range information is a general guideline only. The pay offered to a selected candidate will be determined based on factors such as, but not limited to, the scope and responsibilities of the position, the qualifications of the selected candidate, business considerations, internal equity, and external market pay for comparable jobs. Additionally, comprehensive benefits are part of the total rewards package.
As an equal employment opportunity employer, and in accordance with our core values of impact, safety, respect, integrity, and teamwork, Argonne National Laboratory is committed to a safe and welcoming workplace that fosters collaborative scientific discovery and innovation. Argonne encourages everyone to apply for employment. Argonne is committed to nondiscrimination and considers all qualified applicants for employment without regard to any characteristic protected by law.
Argonne employees, and certain guest researchers and contractors, are subject to particular restrictions related to participation in Foreign Government Sponsored or Affiliated Activities, as defined and detailed in United States Department of Energy Order 486.1A. You will be asked to disclose any such participation in the application phase for review by Argonne's Legal Department. All Argonne offers of employment are contingent upon a background check that includes an assessment of criminal conviction history conducted on an individualized and case‑by‑case basis. Please be advised that Argonne positions require upon hire (or may require in the future) for the individual be to obtain a government access authorization that involves additional background check requirements. Failure to obtain or maintain such government access authorization could result in the withdrawal of a job offer or future termination of employment.