Physics | Engineering internship: electron optical sensitivity simulations

ASML

Delft

Hybrid

EUR 13,000 - 20,000

Full time

2 days ago
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Job summary

ASML in Delft, Netherlands, offers a master’s non-thesis internship focusing on electron optical sensitivity simulations for MEMS in a multi-beam electron microscope. You will adapt models, analyze geometric tolerances, and quantify effects on beam focus and alignment within a hybrid work setting.

You will work with engineers to interpret data from prototype SEM systems, document findings, and communicate recommendations to the design team. Start is Feb/March 2027 for a minimum of five months.

Qualifications

  • Currently enrolled in a master’s degree in physics, applied physics, electrical engineering, computer science, or related field.
  • Bachelor’s degree completed.
  • Solid foundation in physics and mathematics.
  • Experience with Python and scientific computing libraries.
  • Analytical and able to investigate complex technical problems.
  • Proactive, collaborative, and able to communicate findings clearly.
  • Interest in simulation methods, electron optics, or semiconductor technology.

Responsibilities

  • Adapt and parameterize existing simulation models to represent manufacturing variations in MEMS structures.
  • Analyze the impact of geometrical deviations on electron beam focus and alignment.
  • Evaluate how different manufacturing tolerances interact and influence overall system performance.
  • Identify the most critical deviations and quantify their effect on electron optics behavior.
  • Use simulation results to support interpretation of data from prototype SEM systems.
  • Document findings and communicate recommendations to the design team.
  • Collaborate with engineers and researchers to improve understanding of performance sensitivities.

Skills

Python

Education

Master's degree (enrolled)
Bachelor's degree completed
Background in Computer Science

Job description

Introduction

Physics | Engineering internship: electron optical sensitivity simulations

At ASML’s Delft office, you will join a team developing a multi-beam electron microscope used to inspect semiconductor wafers during production. A key part of this system is a micro-electromechanical (MEMS) module that shapes and directs electron beams. Small manufacturing variations in this module can influence electron optics performance, including beam focus and alignment. Understanding these effects is essential for designing reliable and robust products. During the internship, you will help generate insights that support future technology development and improve system performance.

  • Location: Delft, Netherlands
  • Team: Interns and Trainees
  • Work experience: 0-1 year, See job description
  • Educational background: Physics
  • Educational background: Computer Science
  • Educational background: Other technical backgrounds
  • Travel: No
  • Programming languages: Python
  • Workplace type: Hybrid
  • Fulltime/parttime: Full time
Your assignment

During the internship, you will work closely with experienced engineers and researchers to investigate the impact of manufacturing tolerances on a MEMS module used in advanced electron microscopy. You will use simulations and data analysis to understand how geometrical imperfections affect electron beam behavior and identify the most critical design sensitivities. Your findings will support design decisions and contribute to the development of next-generation inspection technology.

Your main responsibilities will be:

  • Adapt and parameterize existing simulation models to represent manufacturing variations in MEMS structures.
  • Analyze the impact of geometrical deviations on electron beam focus and alignment.
  • Evaluate how different manufacturing tolerances interact and influence overall system performance.
  • Identify the most critical deviations and quantify their effect on electron optics behavior.
  • Use simulation results to support the interpretation of data from prototype scanning electron microscope systems.
  • Document findings and communicate recommendations to the design team.
  • Collaborate with engineers and researchers to improve understanding of performance sensitivities.

This is a master’s non-thesis internship for minimum 5 months, 5 days per week (2 days on-site). The start date of this internship is as of February/March 2027.

Your profile

To be suitable for the internship, you:

  • Are currently enrolled in a master’s degree in physics, applied physics, electrical engineering, computer science, or a related field, and have completed a bachelor’s degree.
  • Have a solid foundation in physics and mathematics.
  • Have experience with Python and scientific computing libraries.
  • Are analytical and able to investigate complex technical problems systematically.
  • Are proactive, collaborative, and comfortable communicating technical findings clearly.
  • Have an interest in simulation methods, electron optics, or semiconductor technology.

During the internship, you will contribute to innovative semiconductor technology while developing advanced simulation and analytical skills. You will gain hands-on experience within a multidisciplinary environment and work alongside experts solving complex engineering challenges. The internship provides meaningful exposure to cutting-edge technology development and the opportunity to make a tangible contribution to ASML’s future products.

Other requirements you need to meet

  • You are enrolled at an educational institute for the entire duration of the internship;
  • You need to be located in the Netherlands to perform your internship. If you are currently living or studying outside the Netherlands, your CV or motivation letter should indicate your willingness to relocate;
  • If you are a non-EU citizen studying in the Netherlands, your university is willing to sign the documents relevant to completing an internship (i.e., a Nuffic agreement).

This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.

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