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EPFL seeks a Postdoctoral Researcher in Data-driven X-ray Nanoimaging for Semiconductor Metrology at Villigen, Switzerland. You will develop acquisition and reconstruction frameworks using known device geometry and design information to detect defects from the fewest X-ray measurements, with demonstrations at synchrotron facilities.
The role focuses on algorithm development and processing thousands of diffraction patterns, leading independent research directions, and collaborating with
EPFL - Swiss Federal Institute of Technology Lausanne
Villigen, Switzerland
This position focuses on high-throughput imaging of static structural defects, while the companion position focuses on time-resolved imaging of dynamic processes. Each postdoc will lead their own independent research direction, with an opportunity for close collaborative work.
You will develop an acquisition and reconstruction framework that uses the known geometry, composition, and layout regularity of semiconductor devices as prior information to detect deeply buried defects from the smallest possible number of X-ray measurements. Our pipeline reconstructs each projection from thousands of diffraction patterns, followed by volume reconstruction from projections measured at many rotation angles. These are two inverse problems, each with its own sampling requirements.
The primary focus will be on algorithm development, followed by their demonstration at synchrotron experiments. You will start working with real already existing experimental datasets and will have the opportunity to extend our established reconstruction pipeline, and integrate with new data acquisition methods. You will also get a chance to perform experiments at the cSAXS beamline of the upgraded Swiss Light Source synchrotron, as well as other facilities around the world.