Principal AI/LLM Platform Architect

Accenture; Ottawa; On-site; CAD 108,800 - 220,400; Full time

Job summary

Accenture in Canada seeks a senior AI/LLM Architect to design end-to-end AI platform architectures for enterprise environments. You will own technical designs spanning classical ML, generative AI, and agentic systems, ensuring alignment with business goals and governance standards.

You will lead architecture decisions, ADRs, data flows, and integration specs while mentoring cross-functional teams to deliver measurable business value and stay ahead of AI tooling and patterns.

Qualifications

• Minimum 5 years designing & deploying enterprise AI solutions (agentic, generative, and classical AI/ML).
• Minimum 2 years in agentic, LLM and Generative AI space.
• Minimum 4 years coding in Python.
• Minimum 2 years architecting LLM-driven application patterns.
• Minimum 4 years in ML/NLP solutions and big data engineering.
• Bachelor's Degree or equivalent.

Responsibilities

• Translate business strategy into non-functional requirements for performance, reliability, and cost.
• Lead stakeholder workshops with clients and leadership to align on feasibility and scope.
• Drive technology selection and build-vs-buy decisions for AI platforms and models.
• Architect multi-agent systems and runtime policy enforcement across domains.
• Produce architecture artifacts and guide cross-functional teams to implement solutions.

Skills

Python

AI architecture

Cloud experience

Leadership

Education

Bachelor's degree or equivalent

Tools

OTel

Job description

Accenture in Canada seeks a senior AI/LLM Architect to design end-to-end AI platform architectures for enterprise environments. You will own technical designs spanning classical ML, generative AI, and agentic systems, ensuring alignment with business goals and governance standards.

You will lead architecture decisions, ADRs, data flows, and integration specs while mentoring cross-functional teams to deliver measurable business value and stay ahead of AI tooling and patterns.